ICARUS Chamber Experiment: NCAR_20050325_ETHYL FORMATE_Chlorine radical_No Seed_Cl2 / Ethyl Formate Oxidation, 326 K, 50 Torr O2, #2

Goals: Understand atmospheric oxidation of ethyl formate Specifically, understand behavior of the HC(=O)OCH(O.)CH3 radical (vs. temperature and O2 partial pressure). Summary: Quantify end-product formation in Cl-atom initiated oxidation of ethyl formate, vs. T and O2 partial pressure. Organization: NCAR Lab Affiliation: NCAR ACOM Boulder CO USA Chamber: NCAR First Floor Stainless Steel Experiment Category: Gas phase chemical reaction Oxidant: Chlorine radical Reactants: ETHYL FORMATE Reaction Type: Photooxidation Temperature: 53 Pressure: 760 Torr

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Temporal Range

  • Begin:  2005-03-25
    End:  2005-03-25

Keywords

Resource Type dataset
Temporal Range Begin 2005-03-25
Temporal Range End 2005-03-25
Temporal Resolution N/A
Bounding Box North Lat N/A
Bounding Box South Lat N/A
Bounding Box West Long N/A
Bounding Box East Long N/A
Spatial Representation N/A
Spatial Resolution N/A
Related Links

Related Resource #1 : Icarus Dataset at UC-Davis
Additional Information N/A
Resource Format ASCII
Standardized Resource Format ASCII
Asset Size 4.126 MB
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Creative Commons Attribution 4.0 International License
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Resource Support Email datahelp@ucar.edu
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Distributor NSF NCAR Geoscience Data Exchange
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Metadata Contact Email datahelp@ucar.edu
Metadata Contact Organization NSF NCAR Geoscience Data Exchange

Author Orlando, John H.
Publisher NSF National Center for Atmospheric Research
Publication Date 2023-08-23
Digital Object Identifier (DOI) https://doi.org/10.5065/f51f-h455
Alternate Identifier d789150
Resource Version N/A
Topic Category environment
Progress completed
Metadata Date 2025-10-09T01:35:51Z
Metadata Record Identifier edu.ucar.gdex::d789150
Metadata Language eng; USA
Suggested Citation Orlando, John H.. (2023). ICARUS Chamber Experiment: NCAR_20050325_ETHYL FORMATE_Chlorine radical_No Seed_Cl2 / Ethyl Formate Oxidation, 326 K, 50 Torr O2, #2. NSF National Center for Atmospheric Research. https://doi.org/10.5065/f51f-h455. Accessed 09 October 2025.

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